Restore Implant
Bioactivity in Seconds
Advanced plasma activation system designed to improve dental implant osseointegration and clinical success.
- Cleaner implant surface
- Faster bone integration
- Improved implant stability
POWER CONSUMPTION
200W
FREQUENCY
100Hz-3kHz
DIMENSIONS
62 X 36 X 25 cm
Denti-Bond Plasma Activation Technology
Denti-Bond restores implant bioactivity using cold plasma technology that removes contaminants and increases surface energy without altering implant microstructure.
Unlock the Full Potential of Your Implants
Restore implant bioactivity and improve clinical outcomes with Denti-Bond plasma activation technology.
The Hidden Problem: Implant Surface Aging
During storage and handling, dental implants accumulate hydrocarbon contaminants which reduce surface energy and biological activity. This phenomenon negatively affects early osseointegration.
Surface Contamination
Hydrocarbon accumulation reduces implant bioactivity.
Hydrophobic Surface
Lower wettability limits protein adsorption.
Slower Osseointegration
Reduced cell adhesion delays bone formation.
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Ultra Clean Surface
Removes hydrocarbons and organic contamination.
Super Hydrophilic Surface
Improves surface wettability and protein attachment.
Faster Osseointegration
Promotes stronger bone-to-implant contact.
Improved Stability
Enhances early implant stability.
Chairside Activation
Activation process completed in under 90 seconds.
Universal Compatibility
Works with multiple implant systems.
Technical Specifications
Power Source
AC 110-240V, 50/60Hz)
Power Consumption
200 W
Operating Frequency
100Hz - 3kHz (Adjustable)
Plasma Generation Technology
Dielectric barrier discharge, Plasma Jet
Output Gas
Air, Argon, Helium, Hydrogen
Output Temperature
28 - 35°C (temperature non- damaging to tissue)
Mode Selection
HMI touch screen
Certifications
CE, ISO, RhOST
